December 2016 newsletter

Ion Times

16cm of Deposition Domination

The engineers at Plasma Process Group have developed a higher-current ion source that can achieve 800mA without needing a separate 1000W generator! They poured over every hotspot, analyzed each strap and connection, and evaluated the efficiency of the matching network and made some significant improvements in the interface allowing us to reach such a high beam current!

Photonics West 2017

Our biggest show of the year is coming up soon! Plasma Process Group will be exhibiting at Photonics West 2017 in booth #5046. Come visit us between January 31st and February 2nd in the North Hall of the Moscone Center. See what’s new, chat about what’s old, or run a custom idea by us – we’ll be there to talk to you!

The Impending Holiday Season

It’s that time of year again – when we all eat to much and wish we could remember why we thought spending so much time with family was a good idea. It’s also the time of year when schedules get tight! If you’re hoping to get an order in before the end of the year, now is the time to submit that PO so we can ship that order as soon as possible! Our Source Package and Power Supply lead times are already extending through February, so lock your place in line before it’s too late! As a reminder, Plasma Process Group will be closed for Thanksgiving (Thursday, Nov. 24), Christmas (Monday, Dec. 26) and New Year’s (Monday, Jan. 2)

12cm Ion Beam Source – Featured Product

If you aren’t already using Ion Assist in your coating applications, it’s probably time to start thinking about it. The advantages of using ion assist are extensive, including dramatic improvements in environmental stability, contamination minimization, and better control over absorption to name a few. The 12cm RF Ion Beam Source from Plasma Process Group is a popular choice as an upgrade to evaporative, magnetron, and IBD systems. Providing up to 400mA of ion current at up to 1500V ion energy, our 12cm ion source can even be used as a primary deposition source.

12cm RF Ion Source
12 cm RF Source
12cm Internal Mount Interface
Internal Mount Hardware

When used as an assist ion source, typical applications require more modest current and voltage in the 200mA and 100 – 300V range. Our 12cm ion source is capable of running on pure O2, N2, and many other reactive gases. For applications requiring a bit more flexibility, or for less-than-ideal chamber configurations, the 12cm source is available in an Internal Mount configuration, requiring just three 2.75-inch conflat feedthroughs, and allowing the source to be set freely into the chamber at any angle necessary for your process.

The 12cm source is available with an array of different grids ranging from lightly-dished Molybdenum 130cm focal points to highly-divergent or -convergent options, as well as collimated flat graphite designs.

As a complete package, the 12cm source will include grids, an RF Neutralizer, our single-unit I-Beam 703 power supply, RF Matching Network and Controller, cables, and all the vacuum feedthroughs – everything you need to install and run the source in your chamber! Plus, you’ll get our absolutely unbeatable customer service.


I-Beam 703

RF Neutralizer

Wondering why you want a gridded ion source for your ion assist application? Take a look at these technical papers and their references. Yes, Ion Beam is more expensive, but it makes a huge difference when working with sensitive materials like Tantalum, Niobium, Halfnium, and Zirconium. It also makes steep-edged filters, gratings, and other complex optical devices possible, providing control over the process unachievable with gridless sources.
Of course, if you already have an ion beam source and you just need a vendor for parts and maintenance, give us a call or send an e-mail!

Plasma Process Group – Simple Ion Beam Solutions