Description
The Techne can produce many different oxides such as SiO2, Ta2O5, Nb2O5, and TiO2. Thin films are produced using a physical vapor deposition method where an ion beam reactively sputters a target material in an oxygen background. The ion beam, sputter target and substrate fixture geometry have been optimized for high deposition rate and superior uniformity. Typical deposition rates are 2 to 5 Å/s depending upon the material, with uniformities of 0.5% or better.