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Welcome to our newsfeed where you will find the latest news. In our newsletter you will find a Tech Tip where we provide an in-depth look at common problems for all customers and offer up solutions to help industry. Other articles may include the release of new products, videos, and tech notes. When we attend a trade show, we will let you know when and where so that you can stop by our booth.
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Match Network and Controller for RF Source
A matching network and controller for an RF ion beam source. The matching network uses two variable capacitors that are adjusted automatically using the controller. The matching network and controller are used in conjunction with our IBEAM power supply for RF power delivery to the source. This is just a basic matching network. Please call or email for your specific configuration.
Additional information
| Weight | 5.436 kg |
|---|---|
| Dimensions | 279 × 152 × 229 mm |
| Models | RFVII RF-10-XIII, PT-II |
| Not Configured | Must be configured before use |
The Latest News from Plasma Process Group
Welcome to our newsfeed where you will find the latest news. In our newsletter you will find a Tech Tip where we provide an in-depth look at common problems for all customers and offer up solutions to help industry. Other articles may include the release of new products, videos, and tech notes. When we attend a trade show, we will let you know when and where so that you can stop by our booth.
Subscribe to our newsletter by sending us an email to stay current with the latest news!
