Learning Center

You are here: Home 9 Resources 9 Learning Center

Welcome to our learning center where you will find an assortment of useful information.  If you are new to the world of ion beam, we recommend checking out the 101 series below.

Introduction Guides and Process Help

The Selection Guides below illustrate typical ion beam solutions.  It is always best to chat with us if you are unsure about setting up and selecting a source.  In the Process section, you will find some useful tech notes about a variety of subjects.

Selecting an ion beam source can be a fairly challenging endeavor. The process really starts with the size of the vacuum system for the ion beam source as they require good vacuum conditions for proper operation.  For example, small vacuum systems (e.g. ISO100) with limited pumping capacity, a DC source (like a 3 cm) might be the only option.  Medium pumping stations (e.g. ISO250 or ISO320) can operate a 6 cm and 12 cm sources, in addition to the smaller DC sources.  Larger pumping capacity stations can generally operate all source sizes.

After a source size is selected, the next choice will be grid styles.  Grid assemblies control the ion beam’s shape, or focus.  If the desire is to keep the ion beam on a target to sputter material, then a convergent style grid would be appropriate.  However, if the goal is to have the beam cover a large area, then a divergent style is recommended.

Another choice is to select what type of source/vacuum chamber interface is required.  When a source is mounted directly to a removable flange, that interface is called a flange mount.  If the source needs to be pointed differently than a flange mount configuration, sometimes an internal mount approach is better.

To help you with the process, we posted the selection guides below.

Brochures

Detailed source specifications and configurations are found in our brochures below.  Ion beam sources require stable electronics for operation and our power supply brochures below provide more information.

We currently offer:

  • 3 cm DC source
  • 8 cm DC source
  • 13 cm DC source

New brochures are on the way!

Plasma Process Group power supplies are CE certified and made in the USA.

Beam Information

Next, the Beam Information learning center is all about ion beam coverage.  

First, the Run Data section will have actual operational data from our standard sources.

In addition, Beam Shapes section has coverage diagrams of various size sources with standard grid assemblies.  These coverage diagrams are useful to examine how the ion beam shape is going to change downstream from the source.

Lastly, you can use the Beam Calculator section if you would like to see how the ion beam current density varies at different conditions.  This web-based calculator is rather basic.  If you would like, we can run simulations using our in-house beam calculator if there is something more detailed you need to examine.  Just let us know!

These are typical run data obtained using our vacuum systems.  Some variation in source performance is to be expected for different pumping stations.

Use these diagrams to obtain a first approximation of the beam shape downstream.  Use the Beam Calculator for a better approximation.

Source Care

The Source Care section is all about taking care of the equipment. Proper maintenance and care of the ion beam source, its grids, and the RFN will promote longevity of your investment.

Process Ideas

Below are various papers on ion beam sputter desposition process.

Tech notes about ion beam assisted deposition (IBAD) and related items:

Manuals, Drawings, and Videos

Find these under Technical Support and Videos.

The World of Ion Beam Sources

Ping Us!

Call 1-970-663-6988 Email [email protected]

Affiliated Companies

Plasma Optik offers IBS optical coating services. We have a dual ion beam sputter coating system setup for many types of ion beam sputtered films.

Millennium Machining logo

Millennium Machining offers machining services if you need custom parts, tooling or other hardware for your vacuum system.