We provide the essential equipment for your Ion Beam Sputter (IBS) system including high-performance radio-frequency ion beam sources for precision thin-film deposition, ion beam sputtering, surface cleaning, etching and ion-assisted processing.

Your choices for beam creation include radio frequency (RF) and filament-driven (DC) styles of production type ion beam sources.

We have many sizes of ion beam sources with a large number of interface possibilities. Available in round and linear configurations, PPG ion beam sources support applications in optical coating, semiconductor and MEMS manufacturing, photonics, advanced materials and industrial vacuum processing.

If you are unsure of your selection, visit our Sales Literature section first.

Your Applications of RF Ion Beam Sources

Ion Beam Sputtering

Ion beam sputtering systems are used where coating precision, film density, process stability and repeatability are essential.

Typical applications include:

• High-reflectivity optical coatings
• Antireflection coatings
• Optical filters
• Laser mirrors
• Photonics components
• Precision thin-film coatings
• Oxide and diamond-like carbon coatings

Ion Beam Cleaning and Surface Activation

At lower energies, the ion beam can remove contamination and unwanted surface material before coating or bonding.

Ion beam pre-cleaning can support:

• Improved coating adhesion
• Cleaner substrate interfaces
• Controlled surface preparation
• Removal of residual contamination
• More repeatable thin-film processes

This makes RF ion beam technology particularly valuable in semiconductor, MEMS, photonics and precision optical manufacturing, where surface quality can influence the performance of the finished component.

Ion Beam Etching

A controlled ion beam can remove material from a substrate through physical sputtering. Beam voltage and beam current can be adjusted to match the required etching conditions and process rate.

Ion beam etching is suitable for applications requiring controlled, directional material removal in a high-vacuum environment.

Ion-Assisted Deposition

During ion-assisted deposition, the ion beam is directed toward the substrate while the coating is being deposited. The ion energy can influence film growth and support the production of dense, adherent thin-film structures.

The required source position, working distance and grid geometry depend on the substrate, coating process and desired beam distribution.

Contact us to discuss your ion beam sputtering, ion-assisted deposition, surface-cleaning or ion beam etching application.

Radio Frequency Neutralizer

Our Radio Frequency Neutralizer (RFN) provides electrons into the downstream plasma to neutralize charging effects from the ion beam. The RF Neutralizer creates electrons using an RF discharge. It has no filament which significantly increases its lifetime.

The RFN enables an ion beam source to be used with reactive gas species, like oxygen, that would normally shorten the life of a filament neutralizer. The RFN requires about 5sccm Argon flow. They can be operated on other inert gases such as Xenon.

The RFN is mounted to a flange with a matching network (sold separately). It is typically positioned outside of the beam path but near the ion beam source. Most common flange sizes and types are available to meet your system requirements.

Typical operational life is about 2500 hours before maintenance is required. Ask about our refurbishing services for older RFNs.