Description
Our 16cm RF ion beam source is an industry workhorse, serving as the dominant deposition source in ion beam deposition (IBD) systems around the world. With an output capacity of 600mA, 800mA, or even 1000mA this dynamic and versatile source can satisfy a huge array of needs in deposition and large-scale Ion assist processes. Available with standard molybdenum, collimated graphite, or titanium grids, this source can be used in almost any type of contamination-sensitive ion beam process. This 16cm source can even be equipped with modulators allowing it to be used in metal deposition and etch processes, an operational regime normally challenging for RF ion beam. The source provides a 16cm ion beam which is then shaped by the choice of grids. Convergent, divergent, collimated, and even multi-focal point grids are available with this source.
