Our ion beam sources are used to produce accurate thin film coatings in vacuum deposition systems.

We manufacture ion beam sources used for sputtering material or etch.  The ion beam source works when a discharge, or plasma, is created inside the source.  Ions inside the source are contained using a discharge chamber.  The plasma is created using an RF antenna attached to a matching network and generator.  The ion beam grids or grid assembly is connected to extract the ion beam and it functions to direct the beam towards the target or substrate.

The ion beam source is operated using our IBEAM power supply.  This power supply has a beam module to control the ion energy (voltage) and dose (beam current).  The accelerator module controls the ion trajectories.  The RF module establishes the plasma and the RFN module connects to the neutralizer.

Let us know if we can help with your thin film coatings!


June 2024 Newsletter

Ion beam source video series is now available for old and new users in the industry.

January 2022 Newsletter

December 2021 Newsletter

July 2021 Newsletter

April 2021 Newsletter

October 2020 Newsletter

September 2020 Newsletter

August 2020 Newsletter

April 21 COVID Update

March 25 COVID Plan