This month we are doing an in-depth look at common feedthrough issues that can occur during the installation and operation of an ion source.
The specifics about the ion beam source are covered in this article. You can find additional information in our manuals.
Ion sources can be used for sputtering material or etch. The ion beam source works when a discharge, or plasma, is created inside the source. Ions inside the source are contained using a discharge chamber. The plasma is created using an RF antenna attached to a matching network and generator. The ion beam grids or grid assembly is connected to extract the ion beam and it functions to direct the beam towards the target or substrate.
The ion source is operated using our IBEAM power supply. This power supply has a beam module to control the ion energy (voltage) and dose (beam current). The accelerator module controls the ion trajectories. The RF module establishes the plasma and the RFN module connects to the neutralizer.
Thanks To All Of You
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We recently updated our ion beam profile estimator. This handy tool allows you to input ion beam conditions including a downstream location. An estimated beam profile is plotted which can be downloaded to a CSV file for your own use.
Beam profiles are an excellent method for determining etch and wear patterns. They can also be used to predict sputter target life. This web-based tool is located in our Learning Center or by clicking here: Graphing Calculator
Below is a typical profile from a 16 cm source with 3 focal point grids. The current density in mA/cm^2 is plotted against radial position for a location 30 cm downstream. Give our estimator a try to see what shape your ion beam may be!”