Description
We offer a 23cm RF ion beam source for larger area, high current processes. This RF source is ideal for etch or assist applications. The 23cm ion source is typically used in production environments. Using RF discharge (no filaments) minimizes maintenance requirements, and enables use with typical process gases including many reactive species. Molybdenum grids are available for this ion source in a couple of configurations. The 23cm ion source is typically internal-mounted, but flange mounting is available. Every ion beam installation is unique so we are ready to help meet the requirements of your specific application.
