6 cm RF Ion Beam Source
Our smallest RF source, the 6 cm source can provide all the benefits of radio frequency ion source technology in a smaller, more compact, and less expensive form. With a maximum beam current of 200mA at 1500V, the 6cm source is ideal for smaller production systems. This source also finds a home in etch and ion beam figuring systems with its divergent or convergent grid options. The body of this source is not water-cooled. This reduces the number of vacuum feedthroughs and cost. Designed around the flexibility of internal mounting, the 6cm source is also capable of being mounted directly to a flange for process flexibility. The 6 cm can be run with inert gases, making the 6 cm ideal for any ion beam process.
12 cm RF Ion Beam Source
Used primarily for ion assist, the 12 cm RF ion beam source also finds great value as a deposition source in smaller systems. Providing additional service as a pre-clean source for substrates, the 12 cm is one of the most versatile options available. As with all RF ion sources from Plasma Process Group, the 12cm can run on almost any process gas, including inert species such as argon and xenon, and reactive species like oxygen. It is capable of outputs as high as 400mA at 1500eV. This source is also stable at more common assist conditions like 200mA at 250V. The source provides an ion beam that is shaped by the choice of grids. Available with molybdenum convergent or divergent grids or graphite, the source beam can be optimized for almost any process.
16 cm RF Ion Beam Source
Our 16cm RF ion beam source is an industry workhorse, serving as the dominant deposition source in ion beam sputter (IBS) systems around the world. With an output capacity between 600mA to 1000mA this dynamic and versatile source can satisfy a huge array of needs in deposition processes. This source can be used in almost any type of contamination-sensitive ion beam process. A 16cm source can even be modified for metal deposition and etch processes. The source provides a beam which is then shaped by the choice of grids. Available grid materials are standard molybdenum, collimated graphite, or titanium. Convergent, divergent, collimated, and even multi-focal point grids are available with this source.
23 cm RF Ion Beam Source
We offer a 23cm RF ion beam source for larger area, high current processes. This RF source is ideal for etch or assist applications. The 23cm ion source is typically used in production environments. Using RF discharge (no filaments) minimizes maintenance requirements, and enables use with typical process gases including many reactive species. Molybdenum grids are available for this ion source in a couple of configurations. The 23cm ion source is typically internal-mounted, but flange mounting is available. Every ion beam installation is unique so we are ready to help meet the requirements of your specific application.