16 cm RF Ion Beam Source

Our 16cm RF ion beam source is an industry workhorse, serving as the dominant deposition source in ion beam sputter (IBS) systems around the world. With an output capacity between 600mA to 1000mA this dynamic and versatile source can satisfy a huge array of needs in deposition processes. This source can be used in almost any type of contamination-sensitive ion beam process. A 16cm source can even be modified for metal deposition and etch processes. The source provides a  beam which is then shaped by the choice of grids. Available grid materials are standard molybdenum, collimated graphite, or titanium.  Convergent, divergent, collimated, and even multi-focal point grids are available with this source.