12 cm RF Ion Beam Source

Used primarily for ion assist, the 12 cm RF ion beam source also finds great value as a deposition source in smaller systems. Providing additional service as a pre-clean source for substrates, the 12 cm is one of the most versatile options available. As with all RF ion sources from Plasma Process Group, the 12cm can run on almost any process gas, including inert species such as argon and xenon, and reactive species like oxygen. It is capable of outputs as high as 400mA at 1500eV.  This source is also stable at more common assist conditions like 200mA at 250V. The source provides an ion beam that is shaped by the choice of grids. Available with molybdenum convergent or divergent grids or graphite, the source beam can be optimized for almost any process.